6 May 2015

SemiTEq launches enhanced MBE system

SemiTEq JSC of Saint-Petersburg, Russia, which designs and manufactures high-vacuum and ultra-high-vacuum (UHV) equipment including molecular beam epitaxy (MBE) deposition systems, has released an improved STE35 MBE system.

The STE35's basic configuration (for growing A3B5 materials on substrates with a diameter of up to 100mm) was developed in 2008. Long-term operation testing in different conditions, as well as in close cooperation with end-users, has since allowed SemiTEq to improve the STE35 system design.

Picture: SemiTEq's STE35 MBE system. 

The enhanced STE35 MBE system has a fundamentally new, modernized growth chamber, which resolves several key objectives.

Specifically, the firm has reduced the number of ports for supplying nitrogen. For ease of maintenance, all are now located on the lid of the chamber, combined into a single cryopanel to increase the efficiency of consumption of liquid nitrogen.

SemiTEq has also increased the number of ports for installing source materials, making the system more convenient to use.

Finally, the firm has enabled complete visual control over the progress of technical processes by increasing the number of viewing windows.

See related items:

University of Toronto's Center for Nanotechnology orders second SemiTEq R&D MBE system

SemiTEq launches new generation of PVD & PECVD systems for R&D

Tags: MBE

Visit: http://semiteq.org