16 May 2011

Oxford Instruments wins multiple etch system order from GCS

UK-based etch, deposition and growth system maker Oxford Instruments Plasma Technology (OIPT) has received an order for multiple PlasmaPro System100 ICP 180 etch systems from III-V compound semiconductor foundry service provider Global Communication Semiconductors Inc (GCS) of Torrance, CA, USA. The order will expand GCS' foundry capabilities in dielectric and gallium nitride (GaN) etching and further increase the number of systems installed from Oxford Instruments.

“GCS chose Oxford Instruments because their ICP etchers offer an excellent combination of process capability, consistency, and value,” says GCS’ VP of operations Franklin Monzon. “As a boutique foundry, GCS has a great diversity of customers who utilize a variety of materials, including GaAs, InP, GaN, and Si, to achieve the desired device performance,” he adds. “Most of these customers also require process customization that, in turn, mandates that the process tools be flexible enough for development work but also reliable enough for production.”   

“The addition of the Oxford Instruments ICP etchers backs up and expands our dry etch process capability so that existing customers, especially in the InP and GaN arenas, get faster, better, service, while at the same time allowing GCS to develop new customers,” continues Monzon. “We look forward to expanding our relationship with Oxford Instruments.” The new tools will come on-line during the course of GCS’ expansion.

Tags: OIPT GaN GaAs InP Etch GCS

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Visit: www.oxford-instruments.com