31 January 2011

Istanbul’s Sabanci University orders Vistec e-beam litho system

Vistec Lithography Inc of Watervliet, NY, USA has received its first order from a Turkish university — an EBPG5000plusES electron-beam lithography system for the newly formed Nanotechnology and Application Center (SU-NAC) at Sabanci University in Istanbul. It says that the Gaussian beam system fulfils the challenging requirements of the center, which will collaborate on nanotechnology research with other institutions.

“The EBPG5000plusES is a 100kV high-performance system, which is state of the art,” says SUNAC director Dr Volkan Özgüz. “It will enable us to address the nanotechnology development needs of natural sciences, applied sciences and engineering programs,” he adds. “Due to its flexibility and advantages, the EBPG5000plusES is a perfect investment for the future and will help to establish SUNAC as one of Turkeys leading nanotechnology institution.”

Vistec’s EBPG5000plusES is a dedicated e-beam lithography system developed to meet the diverse requirements for nano-lithography applications in direct write for both R&D and production of GaAs devices. It enables rapid exposure at a rate of 25MHz and a minimum feature size of less than 8nm. The system can also expose various substrate types, including masks, with dimensions up to 150mm in size.

“Due to their flexibility and the multi-user environment, our systems are a perfect match to the needs of universities or industry research institutions,” reckons Vistec Lithography’s general manager Rainer Schmid. “After selling a number electron-beam lithography systems to internationally known institutes in the last year, we are highly motivated to continue this positive development in the upcoming year,” he adds.

Tags: Vistec Electron-beam lithography GaAs devices

Visit: www.vistec-semi.com

Visit: www.sabanciuniv.edu