3 January 2011

SPTS ships APS etch system to Fraunhofer ISIT

SPP Process Technology Systems Ltd (SPTS) of Newport, Wales UK, the plasma etch & deposition equipment subsidiary of Japan’s Sumitomo Precision Products Co Ltd (SPP), has shipped an APS etch system to Fraunhofer-Institut für Siliziumtechnologie ISIT (FhG-ISIT).

The system will add new process capability to ISIT’s MEMS manufacturing line to fuel next-generation development of devices such as actuators, sensors and energy harvesters.

“We have chosen to add APS to extend our offerings to the full range of deep etch processing for all MEMS and related technologies,” says Christian Schroeder, FhG-ISIT's MEMS technology manager. “We are now capable of not only high-performance deep silicon etching, but also for challenging etches in hard materials, such as piezoelectric films, oxide films, glass and Pyrex,” he adds.

“We are pleased to strengthen our existing relationship with this important R&D customer,” says Kevin T. Crofton, executive VP & managing director of SPTS’ Single Wafer Division. “The APS source offers unique processing capabilities with its patent-protected source design, proving to be extremely effective for customers who work with a variety of materials that are difficult to etch using conventional inductively coupled plasma (ICP) tools.”

Tags: SPTS

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