27 August 2011

Stanford Nanofabrication Facility buys additional Plasma-Therm etching systems  

Stanford University is extending its research capabilities in nanotechnology and photonics by purchasing three dry etching systems from plasma process equipment maker Plasma-Therm of St. Petersburg, FL, USA. The new systems complement a previous facility upgrade when two Plasma-Therm deposition systems were ordered in February 2010.

The latest systems, all configured as inductively coupled plasma (ICP) etchers, will add to Stanford’s Nanofabrication Facility (SNF) infrastructure, which has a 10,000 sq. ft. class 100 cleanroom providing researchers with access to nanofabrication equipment and expertise. SNF is one of the 14 universities that make up the US National Science Foundation’s National Nanotechnology Infrastructure Network (NNIN), which provides nanofabrication resources to researchers across the USA in both industry and academia.

The new equipment will focus on high-performance etching of silicon, metals and dielectrics, and are based on Plasma-Therm’s leading product, the VERSALINE. Plasma-Therm claims that its fast process technology suite for deep silicon etching (DSE) and the strength of its service organization were among the differentiating factors. The combination of etching and deposition tools will fulfill many of the processing needs for more than 600 registered SNF users.

“This new set of equipment provides SNF with both upgraded and new capabilities that will stimulate researchers’ imaginations and play a role in scientific discovery,” says Dr David Lishan, principal scientist & director of technical marketing. “For example, our VERSALINE DSE system delivers precise control needed for intricate SOI [silicon-on-insulator] structures and exceptionally smooth feature sidewalls while maintaining the benefits of wide process windows,” he adds.

Tags: Plasma-Therm

Visit: www.plasmatherm.com